KC recently (on Aug.3, 2002) filed a patent application about a diaper system for handling BM
 
     
  This patent application discloses an absorbent article which comprise: (a) a substrate, (b) an aperture in the substrate, positioned to receive BM; and (c) aperture support structure. This aperture support structure positioning and seating the aperture in the gluteal fold between the buttocks of a user and in alignment with, the anus, to receive BM (see the images below).


 

 
  Application title:

Application:
Inventors:

Filed:
Personal care article with aperture aligned for receiving fecal material
20020111598
Vogt Robert Eugene, Serbiak Paul John, Sauer Barbara Oakley
April 3, 2002
 
       
  A similar patent also filed by KC (US6,423,884), issued to Heidi Ann Oehmen on July 23, 2002 discloses an apertured retaining structure placed in the rear portion of the diaper system to control placement of BM.
 
     
     
     
  Uni-charm¡¯s patent (US6,436,083, granted on August 20, 2002) discloses a diaper which does no have gathers but the regions around the legs as well as the crotch region are elastically stretchable longitudinally and transversely.
 
     
  This patent discloses a design in which topsheet and backsheet in the front and rear waist regions are elastically stretchable in a transverse direction while the topsheet and the backsheet at the transversely opposite side edges of the crotch region are elastically stretchable in a longitudinal direction.
 
 
  Application title:
Inventors:
Filed:
Granted:

Disposable diaper fecal material
Mishima Yoshitaka, Sayama Yasushi
June 30, 2000
August 20, 2002